Beamline 41 - Short information
Beamline 41 is used for angle resolved photoelectron spectroscopy on solids in the photon energy range from 15 to 200 eV. The beamline is suited for measurements of both valence bands and shallow core levels. In addition to this basic set-up for band-mapping and photoemission of shallow core levels a molecular-beam epitaxy (MBE) system is available for the growth and in situ studies
of III-V compound semiconductors.
Contact person:
Stefan Wiklund, beamline manager
Janusz Kanski, Chalmers University of Technology
Reference:
U. O. Karlsson, J. N. Andersen, K. Hansen and R. Nyholm, Nucl.
Instr. & Meth. in Phys. Res. A 282, 553, 1989.
Technical data:
| Source |
Bending magnet, 18 mrad. |
| Pre-focusing optics |
Toroidal mirror. |
| Monochromator |
4.7 m, 162 deg. TGM with three gratings
(300 l/mm, 600 l/mm and 1200 l/mm). |
| Energy range |
15 - 200 eV. |
| Energy resolution |
E/dE = ~ 103 |
| Re-focusing optics |
Toroidal mirror. |
| Photon flux on sample |
~ 1010 ph/s. |
| Spot size on sample |
~ fi 2 mm. |
| Experimental station |
The experimental station consists of
an analyzer chamber with a goniometer mounted electron energy
analyzer (VSW HA50), a sample storage chamber and a sample introduction
chamber. The analyzer chamber is equipped with LEED, ion sputtering
gun, gas-inlet system and a number of optional ports for user
owned sample preparation accessories. In addition to this basic
set-up a molecular-beam epitaxy (MBE) system with six Knudsen
cells and a RHEED optics is available for the growth and in
situ studies of III-V compound semiconductors. |
2003-01-22
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