BEAMLINES AT MAX I |
Beamline short info |
Experimental techniques available |
Energy or wavelength range |
Home page |
| 31 |
Scanning photoelectron microscopy |
15 - 150 eV |
|
| 41 |
Angular resolved photoemission |
15 - 200 eV |
|
| 52 |
Angular resolved photoemission, atomic and molecular spectroscopy, luminescence |
5 - 30 eV |
|
| 73 |
Infrared high-resolution spectroscopy and spectromicroscopy |
12000 - 10 cm-1 |
|
BEAMLINES AT MAX II |
Beamline short info |
Experimental techniques available |
Energy or wavelength range |
Home page |
| I311 |
XPS, XAS, PEEM |
30 - 1500 eV |
|
| I411 |
XPS, XAS, coincidence spectroscopy |
50 - 1500 eV |
|
| I511-1 |
XPS, XAS, XES |
50 - 1500 eV |
|
| I511-3 |
XAS, XES |
50 - 1500 eV |
|
| D611 |
Time resolved X-ray diffraction |
2.5 - 8 keV |
|
| I711 |
Crystallography, powder diffraction, SAXS |
0.8 - 1.6 Å |
|
| I811
|
EXAFS
Surface, interface and thin-film crystallography |
2.3 - 20 keV |
|
| I911-1 |
Presently test station, quasi-fixed wavelength |
1.04 Å |
|
| I911-2 |
Macromolecular crystallography, fixed wavelength |
1.04 Å |
|
| I911-3 |
Macromolecular crystallography including MAD and SAD |
0.7 - 2.0 Å |
|
| I911-4
construction |
Macromolecular crystallography, fixed wavelength |
0.91 Å |
|
| I911-5 |
Macromolecular crystallography, fixed wavelength |
0.91 Å |
|
| D1011 |
Circular dichroism, XPS, XAS |
20 - 1500 eV |
|
| I1011 |
Circular dichroism, XAS |
250 - 1500 eV |
|
BEAMLINES AT MAX III |
| I3 |
Angular- and spin- resolved photoemission, atomic and molecular spectroscopy, luminescence |
5 - 50 eV |
|
| I4 |
Angular resolved photoemission
|
13 - 200 eV |
|
